Structural investigation of reactively sputtered boron nitride films
The purpose of this paper is to describe the investigation, by scanning and transmission electron microscopy and X-ray and electron diffraction, of microstructures of boron nitride films deposited on stainless steel substrates by an r.f. sputtering technique. They were found to consist of a mixture of approximately 10 nm diameter grains of cubic structure and smaller, about 1 nm, crystallites of hexagonal structure. The distributions of crystallite sizes were determined directly from dark field electron micrographs. The nominal crystallite diameters derived from X-ray diffraction line broadening measurements were found to be in good agreement with the electron microscopy observations for the hexagonal, but not for the cubic phase. This discrepancy is apparently due to the presence of fine twinning in the cubic grains.
Bibliographic Reference: Article: Thin Solid Films, (1992) No. 209, pp. 155-160
Record Number: 199210870 / Last updated on: 1994-12-02
Original language: en
Available languages: en