P.A.C.V.D. of coatings : From conventional process monitoring towards intelligent processing
Plasma assisted chemical vapour deposition (PACVD) activities are focused on the development of hard coatings, involving the plasma processing of TiN films in a rf capacitive discharge. A real-time intelligent process control to integrate information from the analytical tools with the process variables is being developed at the Advanced Coatings Centre (ACC) at JRC Petten.
Bibliographic Reference: Paper presented: NATO-ARW : Microwave discharges - fundamentals and applications, Vimeiro (PT), May 11-15, 1992
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Record Number: 199210980 / Last updated on: 1994-12-02
Original language: en
Available languages: en