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Plasma assisted chemical vapour deposition (PACVD) activities are focused on the development of hard coatings, involving the plasma processing of TiN films in a rf capacitive discharge. A real-time intelligent process control to integrate information from the analytical tools with the process variables is being developed at the Advanced Coatings Centre (ACC) at JRC Petten.

Additional information

Authors: DIAS A G, JRC Petten (NL);ROSSI F, JRC Petten (NL)
Bibliographic Reference: Paper presented: NATO-ARW : Microwave discharges - fundamentals and applications, Vimeiro (PT), May 11-15, 1992
Availability: Text not available
Record Number: 199210980 / Last updated on: 1994-12-02
Original language: en
Available languages: en
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