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The correlation between sputtering and several features of individual cascades was investigated with the TRIM.SP program. A comparison with other simulation models indicated that the sputtering statistics are not deeply influenced by the target model. Also, the distributions of sputtering related quantities were found to be quite similar when resulting from cascades generated by implanted or backscattered particles, although the number and the distribution of displacements produced can be well distinguished. A partition of the individual cascades based on the sputtering frequency is made. The sputtering energy distributions were found to be similar in all classes. These features illustrate the similarity between the statistics of sputtering from individual and statistical cascades. The situation is different where the relation between the number of sputtered atoms and the surface-deposited energy is concerned. The same number of sputtered atoms is associated with a broad distribution of deposited energies, whose profile is dependent on the number of sputtered atoms, and the sputtering frequency is not always linearly dependent on either the mean or the mode of the surface-deposited energy distribution. Finally, a surface-deposited energy threshold is identified for sputtering, which correlates to the anisotropy of the momentum flux distribution in the vicinity of the surface.

Additional information

Authors: HOU M, Université Libre de Bruxelles, Physique des Solides Irradiés (BE);ECKSTEIN W, Max-Planck Institut für Plasmaphysik, Garching bei München (DE)
Bibliographic Reference: Article: Journal of Applied Physics, Vol. 71 (1992) No. 8, pp. 3975-3980
Record Number: 199211033 / Last updated on: 1994-12-02
Original language: en
Available languages: en
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