The reaction of atomic hydrogen with a-C:H and diamond films
The surface reaction of thermal atomic hydrogen with polycrystalline diamond film prepared by hot-filament assisted chemical vapour deposition has been investigated. Atomic beam techniques in combination with mass spectroscopic detection of the formed product molecules have been used to study hydrogen-induced erosion. When compared with a-C:H films, the reaction of H(0) with diamond films is negligible. The yield is orders of magnitude smaller and reaches maximum values below 1.0 E-4 around 500 K. After starting the atomic hydrogen exposure, a transient behaviour is observed with 10 times higher yield, probably due to a reaction with remaining amorphous carbon.
Bibliographic Reference: Article: Surface and Coatings Technology, Vol. 47 (1991) pp. 156-161
Record Number: 199211073 / Last updated on: 1994-11-29
Original language: en
Available languages: en