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Abstract

Results of X-ray scattering experiments on the antiferromagnetic uranium compounds UO(2), USb and (U(0.85)Th(0.15))Sb are reported. The energy dependence of the X-ray scattering cross-section is reported in the range 3.5-3.9 keV, which includes the M(IV) and M(V) absorption edges. The energy dependencies are very similar and well represented by atomic- resonance methodology. Differences occur in the ratio of intensities (branching ratio) of the two absorption edges, which are larger in UO(2) than in the other materials. Calculations based on atomic physics suggest that such differences may arise from differing 5f-electron configurations. Unfortunately, the absorption coefficient has not been measured accurately over the two edges, so that corrections to the intensities must be regarded as qualitative. This prevents a quantitative comparison between the observed and calculated branching ratios. Consistent with the calculated cross-section, the magnetic scattering of the sigma-polarised incident beam is rotated to pi polarisation. No unusual effects were found at the M(IV) edge of Th in the pseudobinary compound.

Additional information

Authors: TANG C C, University of Keele, Physics Department, School of Physical Science and Engineering (GB);STIRLING W G, University of Keele, Physics Department, School of Physical Science and Engineering (GB);LANDER G H, JRC Karlsruhe (DE);GIBBS D, Brookhaven National Laboratory, Physics Department, New York (US);HERZOG W, Brookhaven National Laboratory, Physics Department, New York (US);CARRA P, European Synchrotron Radiation Facility, Grenoble (FR);THOLE B T, European Synchrotron Radiation Facility, Grenoble (FR);MATTENBERGER K, Eidgenössische Technische Hochschule, Laboratorium für Festkörperphysik, Zürich (CH);VOGT O, Eidgenössische Technische Hochschule, Laboratorium für Festkörperphysik, Zürich (CH)
Bibliographic Reference: Article: Physical Review B, Vol. 46 (1992) No. 9, pp. 5287-5297
Record Number: 199211326 / Last updated on: 1994-11-29
Category: PUBLICATION
Original language: en
Available languages: en