New vaporizing assembly for Q-plasma sources
The design and operation of a new vaporising assembly used for Q-plasma sources are described in this letter. The vaporising system, consisting of two ovens and an effuser, is used to vaporise and direct atoms onto a hot ioniser plate. The hot plate, which may be of tantalum, tungsten or rhenium, singly ionises the atoms on contact. The main advantages of this new assembly, compared to previous designs, are the production of higher plasma densities and the control of the radial plasma profile. The heaters of the two atomic beam ovens are independently controlled and monitored so that the gradients of the radial plasma profile can be modified. Plasma production with two ion species can also be performed.
Bibliographic Reference: Report: INT 180/92 EN (1992)
Availability: Available from Confédération Suisse, Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, 21 avenue des Bains, 1007 Lausanne (CH)
Record Number: 199310027 / Last updated on: 1994-11-29
Original language: en
Available languages: en