Boronization of COMPASS
Boronisation, the plasma-chemical deposition of thin boron/carbon films onto the inner wall of a tokamak, has been developed as a surface conditioning technique to reduce impurity fluxes into the plasma. In this paper the use of trimethyl boron for the boronisation of COMPASS, a tokamak not previously boronised or carbonised, is reported. Two separate boronisations, using different gas and glow discharge parameters, were undertaken, both resulting in excellent long-term impurity control. The layer deposition procedure and the resulting improvements to the tokamak performance are described.
Bibliographic Reference: Article: Journal of Nuclear Materials, Vol. 186 (1992) pp. 217-226
Record Number: 199310450 / Last updated on: 1994-11-29
Original language: en
Available languages: en