Plasma deposition of boron-containing hard carbon films a-C/B:H from organic boron compounds
The plasma-induced deposition of amorphous boron-containing carbon films (a-C/B:H) on the plasma-exposed surfaces of fusion devices (boronisation) is a powerful wall conditioning method to achieve very pure fusion plasmas. Glow discharges in a throughflow of diborane, methane and helium gas have been hitherto used in the boronisation technique. The highly toxic and explosive gas diborane necessitates strict and expensive safety precautions in the complex environment of a tokamak. Experiments were performed in laboratory simulations using the much less hazardous substances trimethyl- and triethylboron as precursors for a-C/B:H deposition. The deposition process was monitored by mass spectroscopy and measurement of the distribution of the primary plasma ions. The a-C/B:H layers were analysed by electron microprobe (EPMA) and sputter Auger electron spectroscopy (AES).
Bibliographic Reference: Article: Plasma Sources Science Technology, Vol. 1 (1992) pp. 82-86
Record Number: 199310451 / Last updated on: 1994-11-29
Original language: en
Available languages: en