Surface treatment of the first wall in fusion devices (carbonization, boronization and related surface chemistry)
The conditioning of the inner wall surfaces in fusion devices by in situ plasma chemical deposition of thin films of carbon (carbonisation) or a boron/carbon mixture (boronisation) has significantly improved the plasma performance. This is achieved by suppression of the metal liberation from the in-vessel components, by the reduction of hydrocarbon formation on carbonaceous surfaces, and by the control of oxygen plasma impurities via gettering processes.
Bibliographic Reference: Article: Vacuum, Vol. 43 (1992) No. 5-7, pp. 413-417
Record Number: 199310456 / Last updated on: 1994-11-29
Original language: en
Available languages: en