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Abstract

A simple doser for atomic hydrogen is described. This consists of a tungsten capillary which on the outlet is heated by electron bombardment to 1,800 - 2,000 K. This temperature is sufficient to achieve nearly total H(2) dissociation under relevant working pressures. The performance of the atomic hydrogen source was tested by H adsorption studies on Cu(110). The saturation coverage on this surface could be achieved with a nominal exposure a thousand times smaller than that used in conventional methods of dissociation on a hot filament. The higher efficiency of the present H source greatly reduces the risk of sample contamination.

Additional information

Authors: BISCHLER U, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);BERTEL E, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE)
Bibliographic Reference: Article: Journal of Vacuum Science and Technology A, Vol. 11 (1993) No. 2, pp. 458-460
Record Number: 199310739 / Last updated on: 1994-11-29
Category: PUBLICATION
Original language: en
Available languages: en