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Abstract

Ion energy distributions (IEDs) were measured in an electron cyclotron resonance (ECR) plasma reactor for argon, methane and methane-hydrogen employing a retarding field analyser. The influence of external parameters such as pressure, magnetic field configuration and gas composition on the IEDs was studied. Typical values for the energy of ions impinging on a grounded sample were between 25 and 20 eV for argon and between 60 and 20 eV for methane in the pressure range 30-170 mPa. The IEDs were very narrow with a full width at half-maximum (FWHM) ranging from 10 to 3 eV in the same pressure range. By applying a dc bias to the sample, the energy of the ions can be controlled without a significant change in the plasma parameters. This method was employed to investigate the growth and structure of C:H films deposited with ion energies between 30 and 200 eV. Most film properties such as density, refractive index and hydrogen content vary linearly in the energy range investigated, but a significant change in the growth rate and in the sp(3)-to-sp(2) ratio in the energy interval 80-120 eV is also found.

Additional information

Authors: JACOB W, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);REINKE P, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);MÖLLER W, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);MOLLER W, Max-Planck-Institut fur Plasmaphysik, Garching bei Munchen (DE)
Bibliographic Reference: Article: Diamond and Related Materials, Vol. 2 (1993) pp. 378-382
Record Number: 199310901 / Last updated on: 1994-11-29
Category: PUBLICATION
Original language: en
Available languages: en