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Nb(0.75)Zr(0.25) thin films have higher critical temperatures than other Nb alloys, which may lead to interesting characteristics. In this work the fabrication of such thin films by sputtering is described, with critical temperatures as high as 10.5 K. Transport critical current measurements on Nb(0.75)Zr(0.25) films whose geometries were photolithographically defined in the micron range are also presented. The measurements were performed as a function both of the temperature and of the magnetic field up to 6 T. The temperature behaviour is compared with the Kim-Anderson model, while the magnetic field behaviour of the resulting pinning force is compared with existing models.

Additional information

Authors: BOFFA V, ENEA, Centro Ricerche Energia Frascati, Roma (IT);PATERNO G, ENEA, Centro Ricerche Energia Frascati, Roma (IT);GAMBARDELLA U, INFN-LNF, Roma (IT);DI GIOACCHINO D, INFN-LNF, Roma (IT);BARBANERA S, CNR-IESS, Roma (IT);MURTAS F, CNR-IESS, Roma (IT)
Bibliographic Reference: Report: RT/NUCL/92/30 EN (1992) 13 pp.
Availability: Available from Servizio Studi e Documentazione, ENEA, Centro Ricerche Energia Frascati, C.P. 65-00044 Frascati, Roma (IT)
Record Number: 199310969 / Last updated on: 1994-11-29
Original language: en
Available languages: en