Bi-implanted silicon reference material revisited : Uniformity of the remaining batch
A remaining batch of 65 samples of the Bi-implanted silicon reference material, issued earlier by the former CBNM of the JRC, has been investigated extensively with respect to the uniformity of the implanted Bi-layer. For this purpose long-term RBS measurements were performed in the multichannel scaling mode. The measured non-uniformity expressed as the relative range of the bismuth fluence between its maximum and minimum values is 7 %. The relative amount of the Bi fluence in individual chips serves as a basis on which to assign individual calibration values to each implanted chip. Furthermore, an estimate of the uniformity within each sample can be deduced from the MCS data.
Bibliographic Reference: Paper presented: 11th International Conference on Ion Beam Analysis, Balatonfüred (HU), July 5-9, 1993
Availability: Available from (1) as Paper EN 37525 ORA
Record Number: 199311335 / Last updated on: 1994-11-28
Original language: en
Available languages: en