Characterization of boron nitride thin films using (alpha, p) nuclear reactions
The nitrogen and boron content of boron nitride films was simultaneously determined using (alpha, p) reactions on nitrogen-14, boron-10 and boron-11. The cross-sections of the reactions were measured in the energy range between 4.0 and 5.0 MeV in steps of 10 to 20 keV at the laboratory angle of 135 using thin polyimide, enriched boron-10 and natural boron targets. The elemental composition of BN-films was determined with an uncertainty of less than 10 %.
Bibliographic Reference: Paper presented: 3rd European Conference on Accelerators in Applied Research and Technology, Orleans (FR), August 31 - September 4, 1993
Availability: Available from (1) as Paper EN 37770 ORA
Record Number: 199311346 / Last updated on: 1994-11-28
Original language: en
Available languages: en