Sticking, adsorption and absorption of atomic H on Cu(110)
The sticking coefficient of atomic hydrogen at T(G) = 1815 K on a Cu(110) surface has been determined to be 18 %. In addition to the buildup of a chemisorption layer, the absorption of atomic H into subsurface sites is observed. The subsurface sites are thermally less stable than the chemisorption sites. Model calculations for the phononic energy transfer and estimates for the parallel momentum transfer, as well as for electron-hole pair excitation, indicate that the first two mechanisms dominate the accommodation process.
Bibliographic Reference: Article: Physical Review Letters, Vol. 70 (1993) No. 23, pp. 3603-3606
Record Number: 199311370 / Last updated on: 1994-11-28
Original language: en
Available languages: en