Time and spatially resolved measurements of electron density in a microwave excited process plasma and discharge modelling
Investigations of a microwave excited Ar/CH(4) process plasma for a-C:H layer deposition have continued. In particular, time and spatially resolved electron density measurements were performed using a far infrared (lambda = 337 micron) laser interferometer. A numerical code has been developed for plasma modelling, taking into account electron impact processes, chemical reactions between neutrals, and ion-neutral reactions. In a cylindrical approach, electron density, temperature and densities of the most important dissociation, ionisation and chemical products are calculated as a function of total pressure and input power.
Bibliographic Reference: Article: XXI International Conference on Phenomena in Ionized Gases : Proceedings II (1993) pp. 193-194
Record Number: 199311392 / Last updated on: 1994-11-28
Original language: en
Available languages: en