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Abstract

The moving-coil waveguide discharge is described as a technique for inner wall coating of metallic tubes. A magnetised microwave plasma, which can be shifted inside a tube by means of the surrounding magnetic coil, is employed for plasma-enhanced chemical vapour deposition of hydrogenated carbon films (C:H) from methane. This article gives an extended overview of the experimental results on thin film deposition and plasma behaviour. A simplified plasma model of the discharge system is discussed, originating from the balance between power absorption and essential loss processes. The model follows the lines given for an electron cyclotron resonance (ECR) plasma in methane with similar power density, but different discharge geometry. The model predictions are corroborated by Langmuir probe measurements in argon plasmas at varying gas pressure. Furthermore, a rough estimate of the deposition rate is derived from the methyl radical flux predicted by the methane plasma model, and compared to experimental data.

Additional information

Authors: HYTRY R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);MÖLLER W, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);WILHELM R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);KEUDELL A V, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);MOLLER W, Max-Planck-Institut fur Plasmaphysik, Garching bei Munchen (DE)
Bibliographic Reference: Article: Journal of Vacuum Science and Technology A, Vol. 11 (1993) No. 5, pp. 2508-2517
Record Number: 199311546 / Last updated on: 1994-11-28
Category: PUBLICATION
Original language: en
Available languages: en
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