Low voltage field emission SEM and microanalysis of multilayer filmsFunded under: JRC-FUSAFE 5C
Thin film technology is dependent on the ability to deposit layers of material of known composition with closely controlled dimensions. Characterisation of layered structures has traditionally involved the use of cross-sectional transmission electron microscopy (TEM) and surface analytical techniques. Low voltage scanning electron microscopy (LVSEM) is, however, an efficient alternative method for examining thin films and multilayers. This article presents details of the work undertaken into this method under the following headings: (i) field emission electron sources; (ii) low voltage microscopy; (iii) the Phi(rho-z) method; (iv) experimental details; (v) multilayer structures; (vi) layer thickness measurements. Future developments are also discussed.
Bibliographic Reference: Article: Microscopy and Analysis, January 1994 (1994) pp. 25-27
Availability: Nuclear Technology Publishing, PO Box 7, Ashford, Kent (GB)
ISBN: ISBN 1 870965 12 4
Record Number: 199410180 / Last updated on: 1994-11-28
Original language: en
Available languages: en