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An enhanced adhesion of thin films deposited on a substrate may be obtained by ion-beam mixing. The resulting migration distance of the atoms of the deposited film into the substrate may be considered as a measure of the mixing efficiency. Thermal migration (diffusion) is also reported to increase the film adherence. The total migration distance of ion-beam mixed aluminium atoms in an iron substrate was determined by means of AES concentration profiles. This distance is composed of a collisional component due to the ion-beam mixing, and a thermal component due to the diffusion of the aluminium atoms at the temperature of the substrate. The migration distance due to the pure thermal diffusion was also obtained from AES profiles by means of reference samples which are not ion-beam mixed. The pure collisional migration distance was determined to be a linear function of the fluence.

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Authors: GAUTSCH O, JRC Ispra (IT)
Bibliographic Reference: Article: Journal of Materials Science and Engineering, Vol. 174 (1994) No. 2, pp. L33-L35
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