Design of an in-situ spectroscopic IR ellipsometer for characterization of plasma-deposited C:H films
A computer-assisted, spectroscopic infrared ellipsometer has been developed for in-situ characterisation of hydrogenated carbon films, deposited from low pressure methane plasmas onto the r.f. powered electrode of a PECVD reactor. The main technical features of the optical measurement system are a cascaded argon arc discharge used as a high-intensity continuum IR light source, two Rochon polarisation prisms, an electronic shutter and high-speed, digital data processing. In the film thickness region between 200 nm and 800 nm, the ellipsometrically determined C:H stretch vibrations remained nearly constant at fixed deposition conditions indicating a homogeneous growth process of the C:H films. For a film thickness below 200 nm, the appearance of C:H oscillations in the measured IR spectra was too low to analyse the structural properties of the films in this range.
Bibliographic Reference: Report: IPP 4/267 DE (1994) 93 pp.
Availability: Available from Max-Planck-Institut für Plasmaphysik, 8046 Garching bei München (DE)
Record Number: 199410507 / Last updated on: 1994-11-28
Original language: de
Available languages: de