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Ultrathin iron films deposited at room temperature on Cu(001) were studied by low energy ion scattering. The films do not grow in layer-by-layer fashion; even at submonolayer coverages iron atoms are observed in the second layer due to iron incorporation into the original surface layer. At coverages exceeding 2 monolayers the copper surface is almost completely covered by iron atoms. An fcc (001) structure is adopted by the iron film up to a coverage of 10 monolayers, where a transition to bcc Fe(110) is observed. All as-deposited films show pronounced diffusion of substrate atoms to the surface upon annealing. The onset temperature for this process varies from room temperature for submonolayer films to about 420 K for films completely covering the copper substrate.

Additional information

Authors: MEMMEL N, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);DETZEL T, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE)
Bibliographic Reference: Article: Surface Science, Vol. 307-309 (1994) pp. 490-495
Record Number: 199410748 / Last updated on: 1994-11-28
Original language: en
Available languages: en
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