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Abstract

The migration distances of the deposited metal film atoms into the Al(2) O(3) substrate after ion-beam mixing with Ar(+) ions may be considered as a measure of the mixing efficiency. The total distance was determined by means of AES and ESCA concentration profiles. The results show that the value does not depend on either ion energy or fluence.

Additional information

Authors: GAUTSCH O, JRC Ispra (IT)
Bibliographic Reference: EUR 15768 EN (1994) 10 pp., free of charge
Availability: Available from Joint Research Centre, Publication Department, I-21020 Ispra (Va.) (IT)
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