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The microstructural and mechanical properties of hot-pressed Si(3)N(4) ceramics after Si(+) ion bombardment and annealing in N(2) atmosphere have been investigated as a function of the ion fluence and the annealing temperature. The irradiations were carried out at target temperatures of about 80 K and 450 K with ion energies of 0.5 MeV and 1.0 MeV. In all cases the fluence range was subdivided into two regimes: a low-fluence regime with improved microhardness and fracture toughness, and a high-fluence regime with an absolute degradation of these properties. Thermal relaxation of the modified mechanical properties was found to occur at temperatures above 800 C. The relationships between the ion-induced changes of the mechanical properties and the microstructural modifications are discussed.

Additional information

Authors: BOLSE W, JRC Petten (NL);PETEVES S D, JRC Petten (NL);SARIS F W, FOM Institute for Atomic and Molecular Physics (NL)
Bibliographic Reference: Article: Applied Physics A, Vol. 58 (1994) pp. 493-502
Record Number: 199410987 / Last updated on: 1994-11-28
Original language: en
Available languages: en
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