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In this work the buildup of damage due to deuterium implantation in highly-oriented pyrolytic graphite (HOPG) is investigated. HOPG was implanted with 10 - 30 keV D(3)(+) at different target temperatures between room temperature and 773 K, with fluences from 1.0 E14 to 1.0 E18 D/cm2. Subsequently, the damage due to the implantation and the retained deuterium were measured by Rutherford backscattering (RBS) in a channelling direction (RBSc) and by the D(3He, rho)alpha nuclear reaction analysis (NRA), respectively. The damage of selected samples was also observed with transmission electron microscopy (TEM). The initial trapping efficiency is unity in the whole temperature and energy range. The maximum retention of the deuterium, however, depends on the temperature and implantation energy.

Additional information

Authors: SIEGELE R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);ROTH J, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);SCHERZER B M U, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);PENNYCOOK S J, Oak Ridge National Laboratory, Tennessee (US)
Bibliographic Reference: Article: Journal of Applied Physics, Vol. 73 (1993) No. 5, pp. 2225-2233
Record Number: 199411045 / Last updated on: 1994-11-28
Original language: en
Available languages: en