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Abstract

This article gives an overview of the experimental results on plasma behaviour and thin film deposition obtained from a running discharge technique inside a rectangular waveguide system. Amorphous hydrogenated carbon films were deposited over a length of 2.5 m on the inner wall of the assembled waveguide system. The average deposition rate was observed and the breakdown of a discharge in the metallic waveguide was studied in argon plasmas depending on magnetic field, microwave power and gas pressure. This plasma behaviour was investigated further by means of a power balance and plasma modelling in methane.

Additional information

Authors: HYTRY R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);MÖLLER W, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);WILHELM R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);MOLLER W, Max-Planck-Institut fur Plasmaphysik, Garching bei Munchen (DE)
Bibliographic Reference: Article: Applied Physics Letters, Vol. 64 (1994) No. 25, pp. 3401-3403
Record Number: 199411140 / Last updated on: 1994-11-25
Category: PUBLICATION
Original language: en
Available languages: en