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The release of implanted hydrogen from pure and boronised graphites is investigated by reemission and thermal desorption (TDS) experiments. In both experiments the release of hydrogen atoms is observed. At low temperatures the release of hydrogen occurs only in the form of molecules. Above temperatures of about 900-1100 K an increasing fraction of the implanted hydrogen is released as atoms. For pure graphite, the reemission of hydrogen atoms starts at about 900 K, whereas the onset of the atomic reemission is shifted to higher temperature for the boronised graphite. In the TDS experiments the release of hydrogen molecules peaks around 1000 K, and the release of atomic hydrogen around 1100-1200 K. From a comparison of the reemission with the TDS data it is concluded that the atomic release of hydrogen from graphite after hydrogen implantation is a thermal process.

Additional information

Authors: FRANZEN P, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);VIETZKE E, Forschungszentrum Jülich GmbH (KFA) (DE)
Bibliographic Reference: Article: Journal of Vacuum Science Technology A, Vol. 12 (1994) No. 4, pp. 820-825
Record Number: 199411251 / Last updated on: 1994-11-25
Original language: en
Available languages: en