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This contribution reports on silicon-doped graphites exposed to the deuterium plasma in a tokamak reactor or in laboratory facilities. This is the first report on C-Si mixtures as candidate materials for plasma facing components. It characterises the composition and structure of initial (non-exposed) and plasma treated C-Si substrates and determines the uptake and retention of deuterium by materials containing different amounts of Si. It also investigates whether the deposited deuterium penetrated into the bulk of the substrates since such processes might have a crucial impact on the tritium inventory in the walls of machines operated with D-T mixtures.

Additional information

Authors: RUBEL M, Association Euratom-NFR, Stockholm (SE);EMMOTH B, Association Euratom-NFR, Stockholm (SE);WIENHOLD P, Forschungszentrum Jülich GmbH (KFA) (DE);ALMQVIST N, Luleå University of Technology, Department of Physics (SE);WU C H, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE)
Bibliographic Reference: Article: Vacuum, Vol. 45 (1994) No. 4, pp. 429-434
Record Number: 199411258 / Last updated on: 1994-11-25
Original language: en
Available languages: en
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