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Abstract

Ti-B-N and Hf-B-N films of varying composition have been deposited by co-sputtering from Ti and BN, or Hf and BN targets, with and without applied substrate bias voltage. The chemical compositions were determined by ESCA spectroscopy, the crystal structure by glancing angle X-ray diffraction, and the hardness H and Young's Modulus E by a depth sensing nanoindenter. Hardnesses of up to 60 Gpa were obtained for films of composition TiB(1.5)N(0.45) and HfB(0.85)N(0.3). Films of this composition also show a very high H/E ratio of 0.15 and are expected to be highly wear resistant. The grain size of these films was found to be extraordinarily small, about 3 nm, and it appears that this property contributes to the high hardness of the films.

Additional information

Authors: FRIESEN T, JRC Ispra (IT);HAUPT J, JRC Ispra (IT);GIBSON P N, JRC Ispra (IT);GISSLER W, JRC Ispra (IT)
Bibliographic Reference: Paper presented: XII Congresso Nazionale sulla Scienza e Tecnologia del Vuoto, Bolzano (IT), marzo 23-26, 1993
Availability: Available from (1) as Paper EN 37400 ORA
Record Number: 199411401 / Last updated on: 1994-12-06
Category: PUBLICATION
Original language: en
Available languages: en