Physical properties of a-C:N films produced by ion beam assisted deposition
This paper presents the preparation of carbon films with up to 30 % nitrogen using an ion beam assisted magnetron with a N(2)(+)/N(+) beam at energies between 50 and 300 eV. The evolution of film density, composition, microstructure and mechanical properties of the films as a function of the deposition parameters is presented.
Bibliographic Reference: Article: Journal of Materials Research, Vol. 9 (1994) No. 9, pp. 2440-2449
Record Number: 199411626 / Last updated on: 1995-01-10
Original language: en
Available languages: en