Thin layer activation in materials technologyFunded under: JRC-ADVMAT 2C
This review considers the use of thin layer activation (TLA) in materials technology. A brief description of the aspects related to surface activation, the measurement methods and the equipment used, including the important point of nuclear safety, are outlined. The specific properties of TLA are discussed, in particular area selectivity and high sensitivity of the method, in addition to the possibility for in situ and on-line monitoring of individual elements and low total activity. The application of TLA is illustrated with some examples from both research and industry, notably wear and corrosion testing and industrial plant monitoring. Due to its specific properties, the method is often an economical and very efficient way of monitoring various surface degradation processes.
Bibliographic Reference: Article: NATO ASI Series (1994) pp. 399-413
Record Number: 199510447 / Last updated on: 1995-04-11
Original language: en
Available languages: en