Deposition of hydrogenated carbon layers from CH(3)(+) ion beamsFunded under: EAEC-FUSION 12C
Carbon deposition and hydrogen co-deposition is investigated as a function of ion energy, fluence and target temperature at normal incidence by bombardment of hydrocarbon molecules onto Si and graphite. An amorphous hydrogen/carbon (a-C:H) layer is formed in a thickness range of 40 to 130 nm by CH(3)(+) bombardment up to a fluence of 3 x 1.0 E18/cm2. The deposition process and the re-erosion phenomenon of the carbon film is also studied. The experimental results are compared with TRIDYN computer simulations and previous experimental results of carbon sputtering by atomic H(+) and C(+) beams in order to have a good understanding of the interaction between hydrocarbon molecular ions and the carbon-based wall in fusion devices.
Bibliographic Reference: Article: Journal of Nuclear Materials, Vol. 220-222 (1995) pp. 1033-1037
Record Number: 199510780 / Last updated on: 1995-07-12
Original language: en
Available languages: en