Role of hydrogen ions in plasma-enhanced chemical vapour deposition of hydrocarbon films, investigated by in situ ellipsometryFunded under: EAEC-FUSION 12C
Hydrocarbon films were deposited by an electron cyclotron resonance methane plasma on to silicon substrates; additional rf bias was applied to vary the kinetic energy of the impinging ions. The ion induced modification of the film properties was investigated by means of a double layer consisting of a polymer-like film with low optical absorption and a hard carbon film with high absorption on top. The deposition of this double layer was monitored in situ by ellipsometry during growth and during erosion in an oxygen plasma at floating potential.
Bibliographic Reference: Article : Applied Physics Letters, Vol. 66 (1995) No. 11, pp. 1322-1324
Record Number: 199510852 / Last updated on: 1995-08-03
Original language: en
Available languages: en