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Abstract

This paper discusses the engineering of conventional TiN coatings to attain hardness of the order of ultrahard coatings by incorporation of silicon atoms in the titanium nitride lattice. An a-priori thermodynamic approach complemented by thermochemical equilibrium calculations is used to evaluate convenient precursors and processing parameters for the production of this novel coating material. The multiphase nature of preliminary test samples deposited by PACVD is confirmed by X-ray diffraction, IR spectroscopy and EPMA analysis. The films are made up of TiN nanocrystallites embedded in an amorphous Si(3)N(4) tissue with small amounts of free Si, as predicted by previous Ti-Si-N phase digram calculations.

Additional information

Authors: DIAS A G, JRC Petten (NL);MORETTO P, JRC Petten (NL);VAN BREDA J H, Netherlands Energy Research Foundation, Energy Engineering Division, Petten (NL);ORDELMAN J, Netherlands Energy Research Foundation, Energy Engineering Division, Petten (NL)
Bibliographic Reference: Paper presented: 10th European Conference on Chemical Vapour Deposition, Venice (IT), September 10-15, 1995
Availability: Available from (1) as Paper EN 39190 ORA
Record Number: 199511353 / Last updated on: 1995-10-31
Category: PUBLICATION
Original language: en
Available languages: en
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