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Abstract

The migration distances of chromium atoms from an 80 nm thick chromium layer have been determined by means of AES concentration profiles of the chromium in the Al(2)O(3) substrate, after ion-beam mixing with 200 keV Ar(+) ions. The value of the migration distance of Cr in Al(2)O(3) is 155 nm and appears to be independent of the fluence of 200 keV Ar(+) ions.

Additional information

Authors: GAUTSCH O, JRC Ispra (IT);MAMMARELLA L G, JRC Ispra (IT)
Bibliographic Reference: EUR 15391 EN (1993) 5 pp., FS, free of charge
Availability: Available from Joint Research Centre, Publication Department, I-21020 Ispra (Va.) (IT)
Record Number: 199511594 / Last updated on: 1995-12-12
Category: PUBLICATION
Original language: en
Available languages: en