Deposition and hydrogen content of carbon films grown by CH(3)(+) ion-beam bombardment
Carbon deposition and hydrogen codeposition is investigated as a function of ion energy, fluence, and target temperature at normal incidence by bombardment of silicon and pyrolitic graphite substrates with mass selected CH(3)(+) molecules. An amorphous hydrogenated carbon layer is formed in a thickness range of 40 nm to 130 nm at a fluence of 3E18 per square cm. The deposition process, the reerosion phenomenon, the hydrogen content, and the H to C ratios of the carbon films are studied between 300 K and 1000 K in the ion energy range from 150 eV to 3 keV. The experimental results are compared with those of TRIDYN computer simulations and previous experimental results of carbon sputtering by atomic H(+) and C(+) beams in order to obtain a better understanding of the interaction between hydrocarbon ions and the carbon based wall materials in fusion devices.
Bibliographic Reference: Article: Journal of Applied Physics, Vol. 78 (1995) No. 9, pp. 5366-5372
Record Number: 199610022 / Last updated on: 1996-02-16
Original language: en
Available languages: en