The Role of Ions for the Deposition of Hydrocarbon Films, Investigated by In-situ Ellipsometry
The growth mechanisms for the deposition of hydrocarbon films from a methane electron cyclotron resonance (ECR) plasma are investigated by means of in situ ellipsometry. Ion bombardment during plasma enhanced chemical vapour deposition of hydrocarbon films mainly governs the properties of the films and the total growth rate. The role of ions for the growth rate and the film properties is discussed in this paper. The ion included modification of the film properties was investigated by a new technique using a double layer consisting of a polymer like film with low optical absorption and a hard carbon film with high absorption on top. The interface between these layers was analyzed after deposition by a layer by layer etching in an oxygen plasma at floating potential. From these data it is possible to determine with high accuracy the range of the ion induced modification of the optical properties in the underlying polymer like film. The thickness of this modified layer ranges from 6 angstroms at 30 V self bias to 40 angstroms at 100 V self bias, which is consistent with the range of hydrogen ions in polymer like films as calculated by the computer code TRIM.SP.
Bibliographic Reference: Article: Materials Research Society Symposium Proceedings, Vol. 388 (1995) pp. 355-366
Record Number: 199610056 / Last updated on: 1996-02-16
Original language: en
Available languages: en