Proceedings of the International Seminar on Quantitative Microscopy
The seminar covered instrumentation, calibration and application topics, including: dispersive interferometric profilometer; a resolution enhancement technique, optoelectronic detector probes; optimization of the shear force technique; near field acoustic microscopy; calibration of scanner displacements; scanning probe microscopes; atomic force microscopes; a measuring laser system; absolute specimen replacement strategy; calibration of a scanning probe microscope; artifact based calibration of the VERITETK 3 scanning force microscope; development of submicrometer critical dimension standards; the National Surface Texture Measuring Facility; calibration of step height standards for nanometrology; calibration of artefacts for the thickness of coatings; scanning tunnelling microscopy; microscopical techniques for critical dimension measurements; generic detrending; calibration standards for roughness measurements; model for the scanning of surfaces by mechanical profiling systems; edge detection by charge coupled devices line; scanning electron microscope investigation of the thickness of coatings; stability and conversion of microstructure in chemical environments by scanning force microscopy; 3-dimensional surface topography quantification; light optical critical dimension and overlay measurements; atomic force microscopy of slip lines produced by plastic deformation of various alloy single crystals; nanostructures produced by a scanning tunnelling microscope.
Bibliographic Reference: Report: PTB-F-21 EN (1995) 144pp.
Availability: Available from Physikalisch Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig (DE)
Record Number: 199610148 / Last updated on: 1996-03-01
Original language: en
Available languages: en