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In this report aerial image formation in a photoresist layer using holographic recording is examined theoretically and experimentally. By applying rigorous electromagnetic theory (REMT) and exactly phase-matching of the E-field and H-field at the top and the bottom interfaces of the photoresist, the exposing intensity distribution inside the photoresist layer can be exactly calculated. Assuming a highly nonlinear material exposure characteristic and suitable processing and development the resulting surface relief shape can be predicted by examination of the intensity contours inside the material. Two approximate models for special cases producing simple analytic expressions are also developed. Experimental results for various layer thicknesses and recording are presented and compared with theory. Based on the successful results it is then proposed to use such gratings as an inexpensive and easily fabricated electron microscope, and microlithographic calibration samples.

Additional information

Authors: SHERIDAN J T, JRC Ispra (IT);COUTSOMITROS C T, JRC Ispra (IT);LUCIA A, JRC Ispra (IT);BABIN S, German Telekom, Physics and Technology Centre, Darmstadt (DE)
Bibliographic Reference: EUR 16397 EN (1996) 31pp., FS
Availability: Available from the Public Relations and Publications Unit, JRC Ispra, I-21020 Ispra (IT)
Record Number: 199610755 / Last updated on: 1996-08-16
Original language: en
Available languages: en
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