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Abstract

In this paper the structure of sputter deposited Ti-B-N thin films of three different compositions has been investigated using glancing angle X-ray diffraction (XRD), extended X-ray absorption fine structure (EXAFS) and near edge X-ray absorption fine structure (NEXAFS).The chemical composition of the films was established by X-ray photoelectron spectroscopy (XPS) and the equilibrium phase composition was calculated from an established phase diagram for the bulk Ti-B-N system. For the Ti-B-N layers low in nitrogen a nanocrystalline TiB(2) type structure was found in accordance with the predictions of the phase diagram. However, for a nitrogen rich layer with the composition Ti-B(1.7)N(1.8) the expected Ti containing phases, principally TiN, did not appear to be well formed. For this layer, the local structure around the central Ti atoms as deduced by EXAFS showed the Ti atoms mainly to be situated in disordered regions, possibly extremely small Ti/B or Ti/N clusters with no long range crystalline order.

Additional information

Authors: MOLLART T P, JRC Ispra (IT);GIBSON P N, JRC Ispra (IT);BAKER M A, JRC Ispra (IT)
Bibliographic Reference: Article: Journal of Physics D : Applied Physics (1996)
Record Number: 199611172 / Last updated on: 1996-10-28
Category: PUBLICATION
Original language: en
Available languages: en