Erosion of amorphous hydrogenated boron-carbon thin films
Amorphous hydrogenated boron-carbon (a-B(1-x)C(x):H) thin films were prepared by radio-frequency plasma-enhanced chemical vapour deposition (RF-PECVD) using CH(4) and (B(2)H(6) + H(2)) as precursor gases. Composition and density was analyzed with ion beam analysis. The films were eroded by hydrogen and helium electron cyclotron resonance (ECR) plasmas. The ion energy during erosion was varied by applying an additional rf bias to the target electrode. Erosion rates were measured by in situ ellipsometry. a-B(1-x)C(x):H films with a carbon content of 15% were shown to be most resistant against erosion with hydrogen plasmas. In contrast, pure a-B:H films exhibit the lowest erosion yield in helium plasmas.
Bibliographic Reference: Article: Journal of Nuclear Materials, Vol. 231 (1996) pp. 151-154
Record Number: 199611345 / Last updated on: 1996-11-21
Original language: en
Available languages: en