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Abstract

Amorphous hydrogenated boron (a-B:H) thin films were prepared by radio-frequency plasma chemical vapor deposition of B(2)H(6) diluted in hydrogen. The influence of deposition parameters on chemical composition and structural properties were determined by ion beam analysis, Fourier transform infrared (FTIR), X-ray photoelectron (XPS) and thermal desorption (TDS) spectroscopy. FTIR and XPS analysis show differences in film stability depending on ion energy. Films deposited at low substrate temperatures and low ion energies undergo chemical changes when exposed to atmosphere. XPS and FTIR revealed that these chemical changes are accompanied by an incorporation of carbon and oxygen into the bulk of the film.

Additional information

Authors: ANNEN A, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);BECKMANN R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);JACOB W, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE)
Bibliographic Reference: Article: Journal of Non-Crystalline Solids, Vol. 209 (1997) pp. 240-246
Record Number: 199710550 / Last updated on: 1997-05-09
Category: PUBLICATION
Original language: en
Available languages: en