Surface relaxation during plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry
The ion-thin film interaction during plasma-enhanced chemical vapour deposition of hydrocarbon films (C:H films) from a methane electron cyclotron resonance plasma was investigated by mean of in situ ellipsometry. The optical constants of the modified surface layer increase with ion energy during deposition, but decrease with the addition of hydrogen to the source gas. When using acetylene instead of methane for the deposition we also find a higher value for the optical constants. After switching off the plasma, the increased optical constants of the surface layer relax to its equilibrium state. The sources of this modified film surface and the mechanisms for its relaxation are discussed in this article.
Bibliographic Reference: Article: Journal of Applied Physics, Vol. 81 (1997) No. 3, pp. 1531-1535
Record Number: 199710551 / Last updated on: 1997-05-09
Original language: en
Available languages: en