Scratch resistant transparent boron-nitride films
Transparent boron nitride (BN) coatings were deposited on glass and Si substrates in a conventional capacitively coupled radio frequency plasma assisted chemical vapour deposition (PACVD) system starting from diborane (diluted in helium) and nitrogen. By varying the plasma conditions (bias voltage, ion current density), coatings were prepared with hardness values ranging from 2 GPa to 12 GPa (measured with nano-identer). Infrared absorption measurements indicate that the BN is of the hexagonal type. A combination of glancing angle x-ray diffraction (GAXRD) measurements and simulations shows that the coatings consist of hexagonal type BN crystallites with different degrees of disorder (nanocrystalline or turbostratic material). (HRTEM) high resolution transmission electron microscopy analysis reveals the presence of an amorphous interface layer and on top of this interface layer a well developed fringe pattern characteristic for the basal planes in h-BN. Depending on the plasma process conditions, these fringe patterns show different degrees of disorder as well as different orientational relationships with respect to the substrate surface. These observations are correlated with the mechanical properties of the films.
Bibliographic Reference: Paper presented: E-MRS/ICAM '97, Strasbourg (FR) June 16-20, 1997
Availability: Available from (1) as Paper EN 40817 ORA
Record Number: 199711241 / Last updated on: 1997-10-10
Original language: en
Available languages: en