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Abstract

Carbon deposition and hydrogen codeposition are investigated as functions of ion energy, fluence and target temperature at normal incidence on silicon and graphite by bombardment with mass selected CH(2)(+), CH(3)(+), CH(4)(+) and CD(4)(+) molecule beams. An amorphous hydrogenated carbon layer (a-C:H) is formed in a thickness range of between 40 nm and 130 nm by CH(3)(+) and CH(2)(+) bombardment up to a fluence of 3 x IE18 /cm{2}. The deposition process, the re-erosion phenomenon and the H/C ratio of the a-C:H films are studied between 300 K and 1100 K in the ion energy range from 0.15 keV to 3 keV by means of ion beam analysis and Auger Electron Spectroscopy (AES). The experimental results are compared with TRIDYN computer simulation and previous experimental results of carbon sputtering by atomic H(+) and C(+) beams in order to gain a better understanding of the interaction between hydrocarbon ions and the carbon-based wall materials in fusion devices.

Additional information

Authors: WANG W, Shanghai Institute of Nuclear Research (CN);ROTH J, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);ECKSTEIN W, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);SCHWOERER R, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);PLANK H, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);DU M, Fudan University, Department of Physics, Shanghai (CN)
Bibliographic Reference: Article: Nuclear Instruments and Methods in Physics Research B, Vol. 129 (1997) pp. 210-216
Record Number: 199711291 / Last updated on: 1997-10-10
Category: PUBLICATION
Original language: en
Available languages: en
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