Chemical erosion of amorphous hydrogenated boron films
Amorphous-hydrogenated boron (a-B:H) and carbon (a-C:H) thin films were prepared by radio-frequency plasma deposition using (B(2)H(6)+H(2)) or CH(4) as a precursor gas. The film composition and density were investigated by ion-beam analysis. The films were eroded by hydrogen electron cyclotron resonance plasmas at floating potential and by atomic hydrogen dissociated by a hot filament. The temperature of the substrates was increased during the erosion process from 330 to 680 K. Erosion rates were measured in situ by ellipsometry.
Bibliographic Reference: Article: Applied Physics Letters, Vol. 71 (1997) No. 10, pp. 1326-1328
Record Number: 199711632 / Last updated on: 1997-12-09
Original language: en
Available languages: en