Community Research and Development Information Service - CORDIS

Abstract

A prominent goal of plasma enhanced chemical vapor deposition (PECVD) is the description of solid film properties, such as refractive index, carbon content, etc, in terms of input variables such as gas pressure, substrate temperature and others. This goal is complicated because of the high dimensions of the input and response variable space. In this paper, data is analysed from C:H film deposition with proper account of measurement errors. It is shown that errors reduce correlations, and that the whole data set can be well described by a multivariate normal distribution.

Additional information

Authors: VON KEUDELL A, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);ANNEN A, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE);DOSE V, Max-Planck-Institut für Plasmaphysik, Garching bei München (DE)
Bibliographic Reference: Article: Thin Solid Films, Vol. 307 (1997) pp. 65-70
Record Number: 199810321 / Last updated on: 1998-03-09
Category: PUBLICATION
Original language: en
Available languages: en