Modelling of the equivalent circuit of inductively coupled plasma sources
This article presents a new approach to investigate and model the electrical characteristics of inductive plasma sources. The technique is primarily based on the measurement of the global electrical parameters of the plasma (complex impedance). The measurements are subsequently numerically fitted to a generic and qualitative electrical model, pre-determined by a classical Bode analysis of a conductive dummy load of size comparable to the plasma itself. The match between the modelling and the experimental data using this new approach shows a drastic improvement compared to the usual inductively coupled plasma (ICP) electrical model, which is also detailed here as a comparison. The article on prospective benefits of an accurate electrical model for ICP plasma sources is concluded, showing in particular that the global electrical parameters of the discharge can be correlated with a fair level of accuracy to the local electrical parameters of the plasma. Beyond the compelling technological necessity to better understand the ICP plasma sources, these results also open many doors towards non-intrusive and accurate plasma monitoring technologies.
Bibliographic Reference: Paper presented: Advanced Technologies Based on Wave and Beam Generated Plasmas, Sozopol (BG), 22 May - 1 June 1998
Availability: Available from (1) as Paper EN 41275 ORA
Record Number: 199810779 / Last updated on: 1998-07-02
Original language: en
Available languages: en