Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films
This paper reports the study of the structure and properties of the ternary alloy a-B(1-x)C(x):H. For this purpose, a-B(1-x)C(x):H films were deposited by radio-frequency plasma chemical vapour deposition (RF-PCVD) over the whole range of compositions from pure a-B:H to pure a-C:H. The film composition was determined by ion-beam analysis (IBA). Fourier transform infrared (FTIR) spectroscopy was applied to investigate the film structure in general and especially the question how hydrogen is bonded to the different boron and carbon sites. Furthermore, vibrations of the B-C network were the object of investigations.
Bibliographic Reference: Article: Thin Solid Films, Vol. 312 (1998) pp. 147-155
Record Number: 199810991 / Last updated on: 1998-09-15
Original language: en
Available languages: en