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Abstract

This paper reports on a study of the oxidation kinetics of a hot-pressed 9 wt% Y(2)O(3), Si(3)N(4) over the temperature range 800 C to 1200 C. Data obtained clearly show that oxidation kinetics are mostly non-parabolic, suggesting that the oxidation mechanism is more complex than simple diffusion. The oxidation kinetics are modelled and the mechanisms discussed.

Additional information

Authors: COSTA OLIVEIRA F A, JRC Petten (NL);BAXTER D J, JRC Petten (NL);UNGEHEUER J, JRC Petten (NL)
Bibliographic Reference: Article: Journal of the European Ceramics Society (1997)
Record Number: 199811187 / Last updated on: 1998-10-09
Category: PUBLICATION
Original language: en
Available languages: en