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Abstract

Transmission electron microscopy is used to determine the grain size distribution and examine planar defect structures in nanocrystalline TiO(2) and SnO(2) films deposited by r f sputtering. The observed defects consist mainly of fine twin lamellae and crystallographic shear planes with a (011) habit plane. These results are discussed in relation to those of previous investigations of stoichiometric and non-stoichiometric thin films and nanocrystalline powders prepared by the inert gas condensation technique. The influence of departures from stoichiometry on the formation of crystallographic shear planes (CSP) and their role as sinks for point defects (oxygen vacancies) is considered.

Additional information

Authors: RICKERBY D G, JRC Ispra (IT);HORRILLO M C, Centro de Tecnologias Fisicas (CSIC), Laboratorio de Sensores, Madrid (ES)
Bibliographic Reference: Article: Nanostructured Materials (1998)
Record Number: 199811332 / Last updated on: 1998-11-10
Category: PUBLICATION
Original language: en
Available languages: en